PVDcoatingfull form

Baptista A, Silva F, Porteiro J, Míguez J, Pinto G. Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands. Coatings. 2018; 8(11):402. https://doi.org/10.3390/coatings8110402

Baptista, Andresa, Francisco Silva, Jacobo Porteiro, José Míguez, and Gustavo Pinto. 2018. "Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands" Coatings 8, no. 11: 402. https://doi.org/10.3390/coatings8110402

Physical vapour depositionmethod PDF

Physicalvapordeposition

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Physical vapour deposition coatingpros and cons

Baptista, Andresa, Francisco Silva, Jacobo Porteiro, José Míguez, and Gustavo Pinto. 2018. "Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands" Coatings 8, no. 11: 402. https://doi.org/10.3390/coatings8110402

Baptista, A.; Silva, F.; Porteiro, J.; Míguez, J.; Pinto, G. Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands. Coatings 2018, 8, 402. https://doi.org/10.3390/coatings8110402

Physical vapour depositionppt

Baptista, A.; Silva, F.; Porteiro, J.; Míguez, J.; Pinto, G. Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands. Coatings 2018, 8, 402. https://doi.org/10.3390/coatings8110402

Baptista A, Silva F, Porteiro J, Míguez J, Pinto G. Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands. Coatings. 2018; 8(11):402. https://doi.org/10.3390/coatings8110402

Feature papers are submitted upon individual invitation or recommendation by the scientific editors and must receive positive feedback from the reviewers.

Abstract: Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. Machining tools are, probably, one of the most common applications of this deposition technique, sometimes used together with chemical vapour deposition (CVD) in order to increase their lifespan, decreasing friction, and improving thermal properties. However, the CVD process is carried out at higher temperatures, inducing higher stresses in the coatings and substrate, being used essentially only when the required coating needs to be deposited using this process. In order to improve this technique, several studies have been carried out optimizing the PVD technique by increasing plasma ionization, decreasing dark areas (zones where there is no deposition into the reactor), improving targets use, enhancing atomic bombardment efficiency, or even increasing the deposition rate and optimizing the selection of gases. These studies reveal a huge potential in changing parameters to improve thin film quality, increasing as well the adhesion to the substrate. However, the process of improving energy efficiency regarding the industrial context has not been studied as deeply as required. This study aims to proceed to a review regarding the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand. Keywords: PVD optimization process; PVD technique; sputtering; magnetron sputtering; deposition improvement; reactors

Feature papers represent the most advanced research with significant potential for high impact in the field. A Feature Paper should be a substantial original Article that involves several techniques or approaches, provides an outlook for future research directions and describes possible research applications.