PVD is a batch coating process with typical cycle times of 1 to 3 hours, depending on the material being deposited and the desired coating thickness. Common coating rates are 50 to 500µm/hr, depending on the technique. Coated components do not require additional machining or heat treatment. The temperature of the substrate being coated is typically in the range of 200-400°C, considerably lower than temperatures associated with CVD (chemical vapor deposition, the other thin-film process). PVD is a line-of-sight process and requires the substrate surface to be easily accessible. Some components are rotated to produce even coatings.

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AEM Deposition is an international company involved in the R & D, manufacturing, and sales of all kinds of Physical Vapor Deposition materials. We provide all materials sputtering targets and evaporation materials for each client. We have 10+ years of experience to manufacture and export deposition materials. If you have any questions or product inquiry, don't hesitate to contact us anytime.